KITA RESEARCH GROUP - Functional Ultrathin Film Engineering -
Material engineering for functionality design of the nano-scaled ultrathin
films and their hetero-interfaces is now having a crucial role in the development
of advanced electron devices. Our researches are focusing on designing
the electric / magnetic / optical functions of device materials and their
stacks, especially for development of highly-efficient energy conversion
power devices and ultralow-power consuming nano-electron devices, toward
the future energy-saving society.
7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 Japan, The University of Tokyo,
Engineering Building #4-441
WHY DON'T YOU JOIN US? 仛 Your visit is anytime welcomed at Room #441 in engineering bld.#4. Please contact Prof. Kita before your visit.
Our new publications are now available on-line!
Papers about newly-found oxidation-induced surface strain on SiC (A. D.
Hatmanto & K. Kita, APEX 2018), and fluorine-induced enhancement of
magnetic interface anisotropy in CoFeB ferromagnetic stacks (M. Pankieiev
& K. Kita, AIP Advances 2018). See our publications
D3 Hirai and M2 Kamata made presentations at 48th IEEE Semiconductor Interface
Specialist Conference (SISC2017, Dec.7-9).See our publications See our gallery
Congratulation! D2 Hatmanto won the Young Research Award at IWDTF2017
held at Todaiji-Temple Cultural Center, Nara. (Nov. 2017)! See our gallery